5 March 2018 In-situ shape measurement technology during large aperture optical planar continuous polishing process
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Proceedings Volume 10710, Young Scientists Forum 2017; 1071033 (2018) https://doi.org/10.1117/12.2317629
Event: Young Scientists Forum 2017, 2017, Shanghai, China
Abstract
Continuous polishing technology is an important means to realize batch processing of large aperture and high precision planar optical components. However, traditional continuous polishing process largely depends on the operator's experience, with poor controllability of component surface figure and unstable processing efficiency. In order to solve this problem, the in-situ shape measurement technologies including measurement of pitch lap surface figure and workpiece surface figure have been proposed in this paper. The real-time states of the pitch lap flatness and the workpiece surface figure in polishing process are obtained by in-situ measurement technologies, which provide the quantitative informations for adjusting process parameters. In the experiment, a large aperture mirror (material as K9; size as 800mm×400mm×100mm) was polished. The results show that the surface figure of the component was improved from λ/2 (1λ=632.8nm) to λ/6 by using the in-situ measurement technologies during the continous polishing process.
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Ruiqing Xie, Defeng Liao, Jian Chen, Shijie Zhao, Xianhua Chen, Baojian Ji, Jian Wang, Qiao Xu, "In-situ shape measurement technology during large aperture optical planar continuous polishing process", Proc. SPIE 10710, Young Scientists Forum 2017, 1071033 (5 March 2018); doi: 10.1117/12.2317629; https://doi.org/10.1117/12.2317629
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