5 March 2018 In-situ shape measurement technology during large aperture optical planar continuous polishing process
Author Affiliations +
Proceedings Volume 10710, Young Scientists Forum 2017; 1071033 (2018) https://doi.org/10.1117/12.2317629
Event: Young Scientists Forum 2017, 2017, Shanghai, China
Continuous polishing technology is an important means to realize batch processing of large aperture and high precision planar optical components. However, traditional continuous polishing process largely depends on the operator's experience, with poor controllability of component surface figure and unstable processing efficiency. In order to solve this problem, the in-situ shape measurement technologies including measurement of pitch lap surface figure and workpiece surface figure have been proposed in this paper. The real-time states of the pitch lap flatness and the workpiece surface figure in polishing process are obtained by in-situ measurement technologies, which provide the quantitative informations for adjusting process parameters. In the experiment, a large aperture mirror (material as K9; size as 800mm×400mm×100mm) was polished. The results show that the surface figure of the component was improved from λ/2 (1λ=632.8nm) to λ/6 by using the in-situ measurement technologies during the continous polishing process.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ruiqing Xie, Ruiqing Xie, Defeng Liao, Defeng Liao, Jian Chen, Jian Chen, Shijie Zhao, Shijie Zhao, Xianhua Chen, Xianhua Chen, Baojian Ji, Baojian Ji, Jian Wang, Jian Wang, Qiao Xu, Qiao Xu, } "In-situ shape measurement technology during large aperture optical planar continuous polishing process", Proc. SPIE 10710, Young Scientists Forum 2017, 1071033 (5 March 2018); doi: 10.1117/12.2317629; https://doi.org/10.1117/12.2317629


Design and manufacturing of a compact two mirror system for...
Proceedings of SPIE (September 24 2017)
In-Process Measurement Of Fast Aspherics
Proceedings of SPIE (April 03 1979)
Testing The Primary Mirror Of The W. M. Keck Observatory
Proceedings of SPIE (March 22 1987)
Optical figure testing by scanning deflectometry
Proceedings of SPIE (September 05 1999)

Back to Top