Ion-assisted magnetron sputter deposition of B4C-doped Ni/Ti multilayer mirrors

Fredrik Eriksson; Naureen Ghafoor; Daniel Ostach; Norbert Schell; Jens Birch

doi:10.1117/12.2317742

21 September 2018 Ion-assisted magnetron sputter deposition of B₄C-doped Ni/Ti multilayer mirrors

Fredrik Eriksson, Naureen Ghafoor, Daniel Ostach, Norbert Schell, Jens Birch

Proceedings Volume 10760, Advances in X-Ray/EUV Optics and Components XIII; 1076006 (2018) https://doi.org/10.1117/12.2317742
Event: SPIE Optical Engineering + Applications, 2018, San Diego, California, United States

Abstract

Ion-assisted magnetron sputter deposition have been used to deposit Ni/Ti multilayer neutron mirrors. Improved interface widths were obtained by using B₄C doping, to eliminate nanocrystallites by amorphization, and a two-stage modulated ion assistance, to obtain abrupt and smooth interfaces. In situ high-energy wide angle X-ray scattering during multilayer depositions was used to monitor the microstructure evolution and to determine the most favourable growth conditions. Post growth X-ray reflectometry in combination with high resolution transmission electron microscopy confirmed the amorhization and revealed significant improvements in interface widths and reduction of kinetic roughening upon applying B₄C doping and modulated ion assistance during growth. Significant improvement of neutron supermirror performance is predicted by employing this technique.

Conference Presentation

Citation Download Citation

Fredrik Eriksson, Naureen Ghafoor, Daniel Ostach, Norbert Schell, and Jens Birch "Ion-assisted magnetron sputter deposition of B₄C-doped Ni/Ti multilayer mirrors", Proc. SPIE 10760, Advances in X-Ray/EUV Optics and Components XIII, 1076006 (21 September 2018); https://doi.org/10.1117/12.2317742

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