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18 September 2018 High performance quantum dot lasers epitaxially integrated on Si
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Abstract
Silicon photonics promises scalable manufacturing of integrated photonic devices through utilization of established CMOS processing techniques and facilities. Unfortunately, the silicon photonics platform lacks a viable light source, which has historically been overcome through heterogeneous integration techniques. To further improve economic viability, the platform must transition to direct epitaxy on Si to bypass the scaling limits imposed by the small sizes and high cost of III-V substrates in heterogeneous integration. InAs quantum dots have demonstrated themselves as the most promising candidate for achieving high performance light emitters epitaxially grown on Si. Using molecular beam epitaxy, we have grown quantum dot lasers composed of InAs dot-in-a-well active layers on industry-standard, on-axis (001) Si substrates. In this report, we utilized p-doping of the quantum dot active region to increase gain for improved dynamic performance and reliability. These devices have been subjected to accelerated aging conditions at 60°C and a bias multiple of twice threshold current density. After 2,750 hours of continuous aging, an extrapolated lifetime of more than 100,000 hours has been calculated.
Conference Presentation
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Justin C. Norman, Zeyu Zhang, Daehwan Jung, Yating Wan, M. J. Kennedy, Alfredo Torres, Robert W. Herrick, Arthur C. Gossard, and John E. Bowers "High performance quantum dot lasers epitaxially integrated on Si", Proc. SPIE 10771, Quantum Communications and Quantum Imaging XVI, 107710D (18 September 2018); https://doi.org/10.1117/12.2319627
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