Front Matter: Volume 10775
Proc. SPIE 10775, Front Matter: Volume 10775, 1077501 (24 September 2018); doi: 10.1117/12.2513695
Wafer Lithography (193i and EUV)
Proc. SPIE 10775, Multi-trigger resist for electron beam and extreme ultraviolet lithography, 1077502 (19 September 2018); doi: 10.1117/12.2316628
Proc. SPIE 10775, Photonic superlattice multilayers for EUV lithography infrastructure, 1077503 (19 September 2018); doi: 10.1117/12.2322410
ML2, NIL, and DSA
Proc. SPIE 10775, Performance validation of Mapper FLX-1200, 1077507 (19 September 2018); doi: 10.1117/12.2324054
Proc. SPIE 10775, Feasibility of monitoring a multiple e-beam tool using scatterometry and machine learning: stitching error detection, 1077508 (19 September 2018); doi: 10.1117/12.2326595
Proc. SPIE 10775, Application of rules-based corrections for wafer scale nanoimprint processes and evaluation of predictive models , 107750A (19 September 2018); doi: 10.1117/12.2326106
Plenary Session
Proc. SPIE 10775, Lithography technology and trends for More than Moore devices: advanced packaging and MEMS devices, 107750C (19 September 2018); doi: 10.1117/12.2326784
Mask Patterning, Metrology, and Process
Proc. SPIE 10775, CK-MASK semi-manual tool for mask inspection and blowing, 107750E (19 September 2018); doi: 10.1117/12.2326607
Proc. SPIE 10775, The (almost) completely automated 12”-lithography, 107750F (19 September 2018); doi: 10.1117/12.2325837
Proc. SPIE 10775, Fast local registration measurements for efficient e-beam writer qualification and correction, 107750G (19 September 2018); doi: 10.1117/12.2325627
Non-IC Applications, Plasmonics, and Photonics
Proc. SPIE 10775, Accurate determination of 3D PSF and resist effects in grayscale laser lithography, 107750I (19 September 2018); doi: 10.1117/12.2326007
Proc. SPIE 10775, Curvilinear data processing methods and verification, 107750K (19 September 2018); doi: 10.1117/12.2326599
Mask2Wafer and Wafer2Wafer Metrology
Proc. SPIE 10775, On the road to automated production workflows in the back end of line, 107750N (19 September 2018); doi: 10.1117/12.2326908
Proc. SPIE 10775, Measuring inter-layer edge placement error with SEM contours, 107750O (19 September 2018); doi: 10.1117/12.2326529
Proc. SPIE 10775, FEM simulation of charging effect during SEM metrology, 107750P (19 September 2018); doi: 10.1117/12.2326609
Using Big Data/Deep Learning
Proc. SPIE 10775, Deep supervised learning to estimate true rough line images from SEM images, 107750R (19 September 2018); doi: 10.1117/12.2324341
Proc. SPIE 10775, Microlens under melt in-line monitoring based on application of neural network automatic defect classification, 107750S (19 September 2018); doi: 10.1117/12.2326397
Poster Session: Wafer Lithography (193i and EUV)
Proc. SPIE 10775, Alternative absorber materials for mitigation of mask 3D effects in high NA EUV lithography, 107750U (19 September 2018); doi: 10.1117/12.2326805
Proc. SPIE 10775, Revival of grayscale technique in power semiconductor processing under low-cost manufacturing constraints, 107750W (19 September 2018); doi: 10.1117/12.2326006
Proc. SPIE 10775, Towards fab cycle time reduction by machine learning-based overlay metrology, 107750X (19 September 2018); doi: 10.1117/12.2500239
Poster Session: ML2, Nano-imprint Lithography, and DSA
Proc. SPIE 10775, Fabrication of nanoparticles for biosensing using UV-NIL and lift-off, 107750Y (19 September 2018); doi: 10.1117/12.2323700
Poster Session: Mask Patterning, Metrology, and Process
Proc. SPIE 10775, Machine learning methods applied to process qualification, 1077510 (19 September 2018); doi: 10.1117/12.2323605
Proc. SPIE 10775, Deposition durability of e-beam mask repair, 1077511 (19 September 2018); doi: 10.1117/12.2323905
Proc. SPIE 10775, Maximizing utilization of large-scale mask data preparation clusters, 1077513 (19 September 2018); doi: 10.1117/12.2326553
Poster Session: Non-IC Applications, Plasmonics, and Photonics
Proc. SPIE 10775, Plasmonic resonances in metal covered 2D hexagonal gratings fabricated by interference lithography, 1077516 (19 September 2018); doi: 10.1117/12.2323763
Proc. SPIE 10775, Approach to combine electron-beam lithography and two-photon polymerization for enhanced nano-channels in network-based biocomputation devices, 1077517 (19 September 2018); doi: 10.1117/12.2326598
Poster Session: Mask2Wafer and Wafer2Wafer Metrology
Proc. SPIE 10775, Limits of model-based CD-SEM metrology, 1077518 (19 September 2018); doi: 10.1117/12.2323696
Proc. SPIE 10775, Manufacturing of roughness standard samples based on ACF/PSD model programming, 1077519 (19 September 2018); doi: 10.1117/12.2327095
Poster Session: Using Big Data/Deep Learning
Proc. SPIE 10775, Research on data augmentation for lithography hotspot detection using deep learning, 107751A (19 September 2018); doi: 10.1117/12.2326563
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