Paper
19 September 2018 Fabrication of nanoparticles for biosensing using UV-NIL and lift-off
Tina Mitteramskogler, Michael J. Haslinger, Astrit Shoshi, Stefan Schrittwieser, Joerg Schotter, Hubert Brueckl, Michael Muehlberger
Author Affiliations +
Proceedings Volume 10775, 34th European Mask and Lithography Conference; 107750Y (2018) https://doi.org/10.1117/12.2323700
Event: 34th European Mask and Lithography Conference, 2018, Grenoble, France
Abstract
A novel technique to realize large quantities of stacked multifunctional anisotropic nanoparticles with narrow size distribution is presented. Through the combination of Ultraviolet Nano-Imprint Lithography (UV-NIL), physical vapor deposition and subsequent lift-off processes we fabricate and disperse these particles in solution for the use in biomolecular sensing applications. Compared to chemical nanoparticle synthesis our approach holds several advantages. First, one can control the nanoparticle shape by choosing an appropriate nanopattern for the UV-NIL process. Second, we can choose the composition of the nanoparticles as the materials are deposited layer-wise by sputter deposition. Third, we can fabricate nanoparticles with very small geometrical variations. This is in contrast to chemical synthesis methods where the layer thicknesses and particle size distribution are harder to control.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tina Mitteramskogler, Michael J. Haslinger, Astrit Shoshi, Stefan Schrittwieser, Joerg Schotter, Hubert Brueckl, and Michael Muehlberger "Fabrication of nanoparticles for biosensing using UV-NIL and lift-off", Proc. SPIE 10775, 34th European Mask and Lithography Conference, 107750Y (19 September 2018); https://doi.org/10.1117/12.2323700
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Cited by 2 scholarly publications.
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KEYWORDS
Nanoparticles

Photomasks

Nanolithography

Biosensing

Etching

Nanoimprint lithography

Polymers

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