Paper
19 November 2018 Continuous detection of particles on a rotating substrate during thin film deposition
Anna Karoline Rüsseler, Istvan Balasa, Lars Jensen, Detlev Ristau
Author Affiliations +
Abstract
Particles, which contaminate the substrate during thin film deposition, are prone to cause irremovable defects and demand special attention in the field of high precision laser optics as they can lead to localized absorption and laser damage. In this contribution, we present a camera based fully in-vacuum device which continuously monitors the coating surface of a transparent test substrate under dark field illumination. We show the possibilities of this setup regarding the sensitivity to small particles (diameter 1 μm). As the first operational test of the particle monitor, singe layers of HfO2 are grown on fused silica. By analyzing the evolution of the scattering intensity of the particles, we derive their position in the substrate-coating-system. Therefore, this in situ particle detection concept can deliver data on which process step is responsible for particle generation in multilayer films and aims to be a tool to minimize coating defects.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anna Karoline Rüsseler, Istvan Balasa, Lars Jensen, and Detlev Ristau "Continuous detection of particles on a rotating substrate during thin film deposition", Proc. SPIE 10805, Laser-Induced Damage in Optical Materials 2018: 50th Anniversary Conference, 108051X (19 November 2018); https://doi.org/10.1117/12.2500210
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KEYWORDS
Particles

Thin films

Reflection

Scattering

Coating

Mie scattering

Light scattering

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