Measurement setup for the determination of the nonlinear refractive index of thin films with high nonlinearity

Morten Steinecke; Tarik Kellermann; Marco Jupé; Detlev Ristau; Lars Jensen

doi:10.1117/12.2500341

20 November 2018 Measurement setup for the determination of the nonlinear refractive index of thin films with high nonlinearity

Morten Steinecke, Tarik Kellermann, Marco Jupé, Detlev Ristau, Lars Jensen

Author Affiliations +

Proceedings Volume 10805, Laser-Induced Damage in Optical Materials 2018: 50th Anniversary Conference; 1080524 (2018) https://doi.org/10.1117/12.2500341
Event: SPIE Laser Damage, 2018, Boulder, Colorado, United States

Abstract

The exploitation of nonlinear effects in multi-layer thin films allows for optics with novel functions, such as all- optical switching and frequency conversion. In this contribution, an improved interferometric setup for the measurement of the nonlinear refractive index in dielectric substrates and deposited single layers is presented. The setup is based on the wave front deformation caused by the self-focusing in the measured samples. Additionally, measurement results for a highly nonlinear material, indium-tin-oxide (ITO) are presented with respect to the materials power handling capabilities and compared to values from other materials.

Citation Download Citation

Morten Steinecke, Tarik Kellermann, Marco Jupé, Detlev Ristau, and Lars Jensen "Measurement setup for the determination of the nonlinear refractive index of thin films with high nonlinearity", Proc. SPIE 10805, Laser-Induced Damage in Optical Materials 2018: 50th Anniversary Conference, 1080524 (20 November 2018); https://doi.org/10.1117/12.2500341

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