12 June 2018 Development of closed-type EUV pellicle
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In this study, we fabricated a closed type EUV pellicle without any gaps by using the mask adhesive, forming the vent holes in the Si border part and putting the sufficiently wide area filters on the top side of Si border. Ventilation performance of closed EUV pellicle was examined during pumping and ventilation condition. As the result, we found that the closed EUV pellicle has enough ventilation performance under the practical pumping down condition. Furthermore, as for EUV pellicle, contamination growth on mask surface during EUV exposure should be suppressed. We fabricated EUV pellicle with coated adhesive as the mask adhesive to suppress the outgas generation which causes the contamination on mask during EUV exposure. EUV irradiation was performed to the base plate which has similar component of the EUV mask surface inside the pellicle space. Contamination growth was not observed for the sample with coated adhesive, but observed for the sample with general adhesive as mask adhesive. Coated adhesives for mask adhesive of EUV pellicle, which keep the adhesive properties, will be suitable for fixing method to suppress the mask contamination during EUV exposure.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yosuke Ono, Yosuke Ono, Kazuo Kohmura, Kazuo Kohmura, Atsushi Okubo, Atsushi Okubo, Daiki Taneichi, Daiki Taneichi, Hisako Ishikawa, Hisako Ishikawa, Tsuneaki Biyajima, Tsuneaki Biyajima, } "Development of closed-type EUV pellicle", Proc. SPIE 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology, 108070I (12 June 2018); doi: 10.1117/12.2324819; https://doi.org/10.1117/12.2324819


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