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1 October 2018 Optical studies of nanocrystalline and amorphous TiO2 thin films deposited by HiTUS technique
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Proceedings Volume 10808, Photonics Applications in Astronomy, Communications, Industry, and High-Energy Physics Experiments 2018; 108084W (2018) https://doi.org/10.1117/12.2501508
Event: Photonics Applications in Astronomy, Communications, Industry, and High-Energy Physics Experiments 2018, 2018, Wilga, Poland
Abstract
TiO2 thin films were deposited on glass substrates by HiTUS (high target utilization sputtering) technique. Structural studies of TiO2 thin films of different thickness were performed by X-ray diffraction. Refractive index and extinction coefficient were measured by spectroscopic ellipsometer. Transmission spectra of TiO2 thin films were investigated in the temperature interval 77-300 K. The temperature behaviour of Urbach absorption edge for TiO2 thin film was studied. The effect of temperature on the optical parameters and order-disorder processes in TiO2 thin films was analysed.
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Ihor Studenyak, Olexander Nahusko, Vitalii Izai, Mladen Kranjčec, Peter Kúš, Marian Mikula, Kanat Mussabekov, and Andrzej Kociubiński "Optical studies of nanocrystalline and amorphous TiO2 thin films deposited by HiTUS technique", Proc. SPIE 10808, Photonics Applications in Astronomy, Communications, Industry, and High-Energy Physics Experiments 2018, 108084W (1 October 2018); https://doi.org/10.1117/12.2501508
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