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3 October 2018 NXE:3400B EUV source performance in the field, readiness for HVM and power scaling beyond 250W
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Abstract
We provide an overview of laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source performance to enable high volume manufacturing and improvements in various technologies for scaling output power of the source. Several companies have multiple systems and are ramping toward production, we will show current output and availability of sources and describe their readiness for HVM. We will show improvements to source architecture that facilitated the increase of EUV power to 250W, and the technical challenges for power scaling of key source parameters and subsystems. The performance of critical subsystems such as the Droplet Generator and Collector protection will be shown, with emphasis on stability and lifetime. Finally, we will describe current research activities and provide a perspective for LPP EUV sources towards 500W.
Conference Presentation
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Igor V. Fomenkov, Michael A. Purvis, Alexander A. Schafgans, Yezheng Tao, Slava Rokitski, Jayson Stewart, Andrew LaForge, Alexander I. Ershov, Robert J. Rafac, Silvia De Dea, Chirag Rajyaguru, Georgiy O. Vaschenko, Mathew Abraham, David C. Brandt, and Daniel J. Brown "NXE:3400B EUV source performance in the field, readiness for HVM and power scaling beyond 250W", Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108091L (3 October 2018); https://doi.org/10.1117/12.2502801
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