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WEREWOLF: sensitivity optimization for early 7 nm EUV masks using an optical 19x nm inspection system
Fast local registration measurements for efficient e-beam writer qualification and correction: EMLC18 Best Paper (Conference Presentation)
Design and implementation of the next generation electron beam resists for the production of EUVL photomasks
AIMSTM EUV first insertion into the back end of the line of a mask shop: a crucial step enabling EUV production
Throughput improvement method for cross-sectional profile measurement of hole patterns in nanoimprint templates
Intra-field mask-to-mask overlay: separating the mask writing from the dynamic pellicle contribution (PMJ18 Best Poster) (Conference Presentation)