3 October 2018 Experimental evaluation of the impact of EUV pellicles on reticle imaging
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Abstract
The purpose of EUV pellicles is to protect the surface of EUV lithography masks from particle contamination. Currently several pellicle prototypes are being developed. It is important to ensure that the optical characteristics of the pellicle membrane do not critically affect the reticle image quality. We present here a study of the impact of a few selected EUV pellicle prototypes on the quality and the contrast of the reticle image obtained with an actinic lensless microscope.
Conference Presentation
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Iacopo Mochi, Marina Timmermans, Emily Gallagher, Marina Mariano Juste, Ivan Pollentier, Rajendran Rajeev, Patrick Helfenstein, Sara Fernandez, Dimitrios Kazazis, and Yasin Ekinci "Experimental evaluation of the impact of EUV pellicles on reticle imaging", Proc. SPIE 10810, Photomask Technology 2018, 108100Y (3 October 2018); doi: 10.1117/12.2502480; https://doi.org/10.1117/12.2502480
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