Direct laser writing lithography technology based on rotating two-dimensional Dammann grating

Jin Wang; Changhe Zhou; Wei Jia; Yongfang Xie; Dong Zhao; Changcheng Xiang

doi:10.1117/12.2327126

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6 November 2018 Direct laser writing lithography technology based on rotating two-dimensional Dammann grating

Jin Wang, Changhe Zhou, Wei Jia, Yongfang Xie, Dong Zhao, Changcheng Xiang

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Proceedings Volume 10818, Holography, Diffractive Optics, and Applications VIII; 1081815 (2018) https://doi.org/10.1117/12.2327126
Event: SPIE/COS Photonics Asia, 2018, Beijing, China

Abstract

The direct laser writing lithography technology is an efficient way to make the large-sized diffraction gratings. It has the advantages of high efficiency, low cost and high flexibility. For further improvement the performance of the direct laser writing technology, we introduced the two-dimensional Dammann grating into the direct laser writing system. The Dammann grating can create a finite array of uniform intensity spots so that the efficiency of the writing can be increased. In addition, we also proposed a way of rotating the two-dimensional Dammann grating. By the geometric relationship, the expressions of the rotation angle can be derived. Considering the efficiency, the uniformity and the price of the 1D Dammann, we proposed the rotating 2D Dammann grating technology based on the 1D Dammann grating. While the rotation angles of 1D Dammann grating and the 2D Dammann grating are different. The efficiency of laser writing based on 2D Dammann is quite higher than the 1D-Dammann laser writing. We can use this method to fabricate the large-sized diffraction gratings efficiently.

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Jin Wang, Changhe Zhou, Wei Jia, Yongfang Xie, Dong Zhao, and Changcheng Xiang "Direct laser writing lithography technology based on rotating two-dimensional Dammann grating", Proc. SPIE 10818, Holography, Diffractive Optics, and Applications VIII, 1081815 (6 November 2018); https://doi.org/10.1117/12.2327126

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