Paper
24 July 2018 Fabrication of convex blazed grating by native substrate grating mask
Author Affiliations +
Proceedings Volume 10827, Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018); 108272B (2018) https://doi.org/10.1117/12.2501036
Event: Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018), 2018, Shanghai, China
Abstract
Hyperspectral imaging spectrometer is an important measurement and analysis instrument, which combines imaging with spectrum technology. Nowadays, it has been widely used in research fields of atmosphere, ocean, geology, ecology, astronomy and so on. Convex blazed grating is a key component in the hyperspectral imaging spectrometer. At present, holographic-ion beam etching is an important method to fabricate convex blazed gratings. The common way of holographic-ion beam etching is that to etch the photoresist grating mask directly. However it is difficult to control the groove of photoresist mask accurately. This paper proposes a method of fabricating convex blazed grating by native substrate grating mask, ion beam etching and reactive ion beam etching are used to fabricate a native substrate grating mask based on photoresist grating. The diffraction efficiency of the convex blazed grating is investigated by FDTD (Finite Difference Time Domain) theory. The first-order diffraction efficiency can be over 45% within visible to near-infrared waveband through controlling the blaze angle from 6.4° to 7.2°. Furthermore, a convex blazed grating has been fabricated with the period of 2.45um, the blaze angle of 6.8° and the anti-blaze angle of 60°, theoretical analysis shows that the first-order diffraction efficiency is more than 50% within visible to near-infrared waveband.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Peiliang Guo, Quan Liu, Yanfeng Su, Yifan Lu, and Jianhong Wu "Fabrication of convex blazed grating by native substrate grating mask", Proc. SPIE 10827, Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018), 108272B (24 July 2018); https://doi.org/10.1117/12.2501036
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KEYWORDS
Diffraction gratings

Etching

Diffraction

Spectroscopy

Ion beams

Photoresist materials

Reactive ion etching

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