Multi-wavelength investigation of the influence of polarization orientation on bulk damage resistance of type I doubler KDP crystals

Yin-Bo Zheng; Rong-Sheng Ba; Xin-Da Zhou; Jie Li; Lei Ding; Jing Yuan; Hong-Lei Xu; Jin Na; Ya-Jun Li; Huan Ren; Xiao-dong Tang; Li-qun Chai

doi:10.1117/12.2506536

18 January 2019 Multi-wavelength investigation of the influence of polarization orientation on bulk damage resistance of type I doubler KDP crystals

Yin-Bo Zheng, Rong-Sheng Ba, Xin-Da Zhou, Jie Li, Lei Ding , Jing Yuan , Hong-Lei Xu , Jin Na , Ya-Jun Li, Huan Ren , Xiao-dong Tang , Li-qun Chai

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Proceedings Volume 10839, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment; 108391D (2019) https://doi.org/10.1117/12.2506536
Event: Ninth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT2018), 2018, Chengdu, China

Abstract

This work presents the influence of polarization orientation on bulk damage performance of type I doubler KDP crystals under different wavelengths pulses exposure. Pinpoints densities (PPD) and the size distribution of pinpoints are extracted through light scattering pictures. The obtained results strongly indicate that the measured PPD as a function of the fluence are both wavelength and polarization orientation related, while neither fluence nor polarization orientation affect the size distribution of pinpoints. We also find that the bulk damage characteristics can divide into three sorts with respect to the wavelength, suggesting the existence of different species of precursors and different mechanisms responsible for bulk damage initiation in SHG KDP crystals.

Citation Download Citation

Yin-Bo Zheng, Rong-Sheng Ba, Xin-Da Zhou, Jie Li, Lei Ding , Jing Yuan , Hong-Lei Xu , Jin Na , Ya-Jun Li, Huan Ren , Xiao-dong Tang , and Li-qun Chai "Multi-wavelength investigation of the influence of polarization orientation on bulk damage resistance of type I doubler KDP crystals", Proc. SPIE 10839, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment, 108391D (18 January 2019); https://doi.org/10.1117/12.2506536

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