Study of optic and laser-induced damage properties of Ta2O5 films deposited by different process parameters

Houjun Li; Jun-qi Xu; Mian Li; Jian Wang; Jun-hong Su

doi:10.1117/12.2504780

6 February 2019 Study of optic and laser-induced damage properties of Ta₂O₅films deposited by different process parameters

Houjun Li, Jun-qi Xu, Mian Li, Jian Wang, Jun-hong Su

Author Affiliations +

Proceedings Volume 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology; 1084216 (2019) https://doi.org/10.1117/12.2504780
Event: Ninth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT2018), 2018, Chengdu, China

Abstract

The Ta₂O₅ thin film is one of the most important high refractive materials in the band range from visible to near infrared. In this paper, Ta₂O₅ thin films were prepared by electron beam thermal evaporation(EBE) technology with different process parameters. The optical performance parameters of Ta₂O₅thin films with different process parameters were tested, and the process parameters of the minimum extinction coefficient and the highest laser-induced damage threshold of Ta₂O₅ thin films were obtained. The results show that when the optimum process parameters are: electron beam current 110 mA, pressure 2.0×10 ^-2Pa, substrate temperature 150°C, the extinction coefficient of the prepared Ta₂O₅ thin film is the minimum; when the optimum process parameters are: pressure 1.0×10 ^-2 Pa, substrate temperature 150°C, The laser-induced damage threshold (LIDT) of the prepared Ta₂O₅ thin film is the highest when the electron beam current is 90 mA. The research results have reference significance for the selection of process parameters of Ta₂O₅ thin film with different the laser-induced damage thresholds.

Citation Download Citation

Houjun Li, Jun-qi Xu, Mian Li, Jian Wang, and Jun-hong Su "Study of optic and laser-induced damage properties of Ta₂O₅films deposited by different process parameters", Proc. SPIE 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology, 1084216 (6 February 2019); https://doi.org/10.1117/12.2504780

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KEYWORDS

Thin films

Laser induced damage

Laser damage threshold

Mass attenuation coefficient

Electron beams

Protactinium

Refractive index

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