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6 February 2019 Double-beam laser interference lithography based on optical field modulation
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Abstract
In the micro-nano structure manufacturing field, large field of view, flexibility, and single exposure are the advantages of laser interference lithography. However, this method can only produce periodic patterns. In this paper, laser interference lithography and optical field modulation techniques are combined. By adjusting the parameters such as the phase and amplitude of the incident light beam, a light field modulation interference model was constructed to study the relationship between the parameters of the incident light beam and the intensity distribution of the interference light field. We verified the feasibility of the method through simulation. Considering the performance of existing optical modulation devices such as the pixel size of spatial light modulators, we discuss the challenges of this approach and the actual resolution that can be achieved. There is no doubt that this provides a new direction for the preparation of multiscale, variable period micro-nano patterns.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fuping Peng, Wei Yan, Fan Yang, and Fanxing Li "Double-beam laser interference lithography based on optical field modulation", Proc. SPIE 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology, 108421C (6 February 2019); https://doi.org/10.1117/12.2510947
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