Realization of erythemal UV detector using antiparallel connection of the two GaN based photodiodes

Yang Hu; Jun Wang; Jin Guo; Guowei Chao; JunBo Feng

doi:10.1117/12.2504896

8 February 2019 Realization of erythemal UV detector using antiparallel connection of the two GaN based photodiodes

Yang Hu, Jun Wang, Jin Guo, Guowei Chao, JunBo Feng

Proceedings Volume 10843, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Sensing and Imaging; 1084306 (2019) https://doi.org/10.1117/12.2504896
Event: Ninth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT2018), 2018, Chengdu, China

Abstract

In this paper, we present the design and characterization of a novel GaN based ultraviolet (UV) detector. The detector consists of two GaN PIN diodes, connected in antiparallel configuration. Two layers of AlGaN, a 100 nm Al_0.4Ga_0.6N barrier layer and a 400 nm Al_0.33Ga_0.67N filter layer are deposited on top of one of the PIN diodes. The filter layer exhibits strong absorption of photons at about 310 nm and below. The barrier layer improves the short wave rejection ratio as it can prevent the diffusion of the carriers generated in the filter layer. Due to the antiparallel connection of the two diodes, the cutoff wavelength of the detector is 300 nm and the overall photocurrent of the detector provides good similarity to the Erythemal action spectrum.

Citation Download Citation

Yang Hu, Jun Wang, Jin Guo, Guowei Chao, and JunBo Feng "Realization of erythemal UV detector using antiparallel connection of the two GaN based photodiodes", Proc. SPIE 10843, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Sensing and Imaging, 1084306 (8 February 2019); https://doi.org/10.1117/12.2504896

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