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12 December 2018 Front Matter: Volume 10844
Proceedings Volume 10844, Advanced Laser Technology and Applications; 1084401 (2018) https://doi.org/10.1117/12.2521330
Event: International Symposium on Optoelectronic Technology and Application 2018, 2018, Beijing, China
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 10844 including the Title Page, Copyright information, Table of Contents, Introduction, and Conference Committee listing.

The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org.

The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon.

Please use the following format to cite material from these proceedings:

Author(s), “Title of Paper,” in Advanced Laser Technology and Applications, edited by Shibin Jiang, Lijun Wang, Zejin Liu, Wei Shi, Pu Zhou. Proceedings of SPIE Vol. 10844 (SPIE, Bellingham, WA, 2018) Seven-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510623309

ISBN: 9781510623316 (electronic)

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Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:

  • The first five digits correspond to the SPIE volume number.

  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.

Authors

Numbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Abudurexiti, A., 08

Aikanbaier, K., 08

Bai, Yangbo, 11

Bo, Tiezhu, 0U

Boneberg, Johannes, 0O

Cai, Meng, 0E

Cao, Dongdong, 0A

Chen, Fang, 0E

Chen, Jian-hong, 0D

Chen, Meng, 0R

Chen, Sheng-Ping, 0B

Cheng, Chi, 0M

Cheng, Zhen, 09

Chu, Quihui, 0V

Cong, Menglong, 03

Cui, Lixuan, 0H

Deng, Songwen, 0Q

Dong, Xiang-cheng, 0D

Dou, Zhiguo, 0A

Feng, Jing, 0V

Feng, Yuechong, 0U

Feng, Yuyi, 0O

Fu, Shijie, 04, 05, 06, 15, 16

Gao, Xiaoqiang, 0R

Geng, Jian, 0Y

Geng, Pengcheng, 0S

Gong, Faquan, 0Q

Graus, Philipp, 0O

Guo, Qi, 0I

Han, Hetong, 02

Han, Qingbang, 0C

Hao, Ge-yang, 0Z

He, Jun-Fang, 09

Hu, Yonghao, 0H

Huang, Lingling, 0O

Jia, Bo, 0N

Jia, Guorui, 0M

Jia, Jing, 0C

Jia, Yong, 0Q

Jiang, Xueping, 0C

Jiang, Zongfu, 07, 0K, 14

Jin, Guangyong, 13

Jin, Li, 0Y

Jin, Yaxue, 02

Jin, Yuqi, 0Q

Ke, Xin, 11

Ke, Xizheng, 0F

Kemmer, Tobias, 0O

Lai, WenChang, 12

Leiderer, Paul, 0O

Li, Bangjun, 0H

Li, Baozhu, 0H

Li, Bin, 11

Li, Cuiping, 11

Li, Gang, 0Q

Li, Jingyi, 13

Li, Meihua, 0L

Li, Na, 0N

Li, Qi, 0Z

Li, Qiushi, 0L, 0T

Li, Shu-Li, 09

Li, Xia, 0G

Li, Yuan-Yuan, 09

Li, Zhixian, 0P

Li’e, Ouyang, 0V

Liu, Bo, 0Z

Liu, Heng, 15

Liu, Hui, 0U

Liu, Juan, 0O

Liu, Rui, 0Q

Liu, Wei, 07, 0Z

Liu, Wenguang, 0K, 14

Liu, Xingrun, 0G

Liu, Zhaohui, 0F

Lu, Shang, 0R

Lu, Yao, 0K, 14

Luo, Lele, 0A

Luo, Liyi, 0N

Luo, Wen-Feng, 09

Luo, Yun, 0V

Ma, Jing, 0X

Ma, Pengfei, 07

Ma, Xianhua, 0H

Ma, Yanxing, 14

Ma, Yuwei, 0X

Mao, Yuanho, 0P

Mi, Zhiyuan, 0I

Nemitz, Clayton A., 0O

Ning, Ding, 0S

Pan, Honggang, 11

Pan, Mingyan, 02

Pan, Rong, 0S

Pang, Lu, 0S

Peng, Hongpan, 0R

Qi, Hongji, 02

Qu, Zhou, 0L, 0T

Ren, Guangjun, 11

Schmidt-Mende, Lukas, 0O

Sheng, Quan, 15, 16

Shi, Chaodu, 16

Shi, Guannan, 16

Shi, Wei, 04, 05, 06, 15, 16

Shi, Xiaoxuan, 0U

Shi, Yi, 0V

Si, Xi, 0L

Song, Zhaohui, 02

Sun, Dandan, 03

Tian, Jiajun, 0J

Wang, Biao, 0S

Wang, Caili, 0U

Wang, Jianjun, 0V

Wang, Jiuwang, 0U

Wang, Qingxue, 11

Wang, Rui, 0J

Wang, Yi, 0X

Wang, Yiding, 03

Wang, Ying, 0F

Wang, Yongtian, 0O

Wang, Zefeng, 0P

Wang, Ziye, 0M

Wei, Xiaole, 15

Wen, Jing, 0V

Wu, Guo-jun, 0Z

Wu, Haolong, 14

Wu, Kaifeng, 0G

Wu, Qianchao, 0J

Xie, Kun, 0K, 14

Xie, Zhaoxin, 04, 05, 06

Xu, Ke, 0J

Xu, Qingshan, 0G

Xu, Ying, 0G

Xu, Ze-Hua, 0B

Xuan, Jiabin, 0N

Yan, Kexin, 0I

Yang, Baolai, 14

Yang, Ce, 0R

Yang, Sen-Lin, 09

Yang, Xianheng, 0V

Yang, Xiaoqian, 0I

Yang, Xin, 0B

Yang, Yanfu, 0J

Yao, Jianquan, 04, 05, 06, 15, 16

Yao, Yong, 0J

Ye, Jifei, 0A

Yi, Yongqing, 0S

Yin, Benkang, 0F

You, YunFeng, 0V

Zhang, Guoan, 0Y

Zhang, Haiwei, 11

Zhang, Hui, 02

Zhang, Mo, 0X

Zhang, Tianhao, 0I

Zhang, Tian-yun, 0D

Zhang, Wei, 13

Zhang, Xian, 0U

Zhang, Xihe, 0Q

Zhang, Ying, 0M, 0N

Zhang, Yuansheng, 0E

Zhao, Huijie, 0I, 0M, 0N

Zhao, Lei, 0V

Zhao, Xiao-Xia, 09

Zhao, Xuesong, 13

Zheng, Xiao-ping, 0D

Zhou, Pu, 07, 12

Zhou, Qiong, 0K

Zhou, Qu, 0L

Zhu, Maodong, 02

Zhu, Xiaojun, 0Y

Zhu, Xijuan, 0G

Zou, Li, 0Y

Conference Committee

Conference Chair

  • Guangjun Zhang, Southeast University (China)

Conference Co-chairs

  • Junhao Chu, Shanghai Institute of Technical Physics (China)

  • Qionghai Dai, Tsinghua University (China)

  • Dianyuan Fan, Shenzhen University (China)

  • Jiancheng Fang, Beihang University (China)

  • Gu Min, Royal Melbourne Institute of Technology University (Australia)

  • Desheng Jiang, Wuhan University of Technology (China)

  • Huilin Jiang, Changchun University of Science and Technology (China)

  • Lin Li, The University of Manchester (United Kingdom)

  • Yueguang Lv, Chinese Academy of Engineering (China)

  • Zhejin Liu, National University of Defense Technology (China)

  • Wang Xiaomo, China Academy of Electronics and Information Technology (China)

  • Huaming Wang, Beihang University (China)

  • Lijun Wang, Changchun Institute of Optics, Fine Mechanics and Physics (China)

  • Wei Wang, China Aerospace Science and Technology Corporation (China)

  • Jianyu Wang, Shanghai Branch of Chinese Academy of Sciences (China)

  • Zuyan Xu, The Technical Institute of Physics and Chemistry (China)

  • Jiubin Tan, Harbin Institute of Technology (China)

  • Jianquan Yao, Tianjin University (China)

  • Hao Yin, China Electronic Systems Engineering Corporation (China)

  • Shaohua Yu, Wuhan Research Institute of Posts and Telecommunications (China)

  • Renhe Zhang, Institute of Acoustics (China)

  • Zisen Zhao, Wuhan Research Institute of Posts and Telecommunications (China)

  • Liwei Zhou, Beijing Institute of Technology (China)

  • Shouhuan Zhou, North China Research Institute of Electro-optics (China)

  • Zhongliang Zhu, Southwest Electronic Telecom Technology Research Institute (China)

Program Committee

  • Byoungho Lee, Seoul National University (Korea, Republic of)

  • Liangcai Cao, Tsinghua University (China)

  • Weibiao Chen, Shanghai Institute of Optics and Fine Mechanics (China)

  • Haimei Gong, Shanghai Institute of Technical Physics (China)

  • Sen Han, University of Shanghai for Science and Technology (China)

  • Huikai Xie, University of Florida (United States)

  • John McBride, University of Southampton (United Kingdom)

  • Yanbiao Liao, Tsinghua University (China)

  • Dong Liu, Zhejiang University (China)

  • Jian Liu, Harbin Institute of Technology (China)

  • Jin Lu, Tianjin Jinhang Institute of Technical Physics (China)

  • Mircea Guina, Tampere University of Technology (Finland)

  • Shibin Jiang, AdValue Photonics, Inc. (United States)

  • Guohai Situ, Shanghai Institute of Optics and Fine Mechanics (China)

  • Hongbo Sun, Tsinghua University (China)

  • Yongtian Wang, Beijing Institute of Technology (China)

  • Yuelin Wang, Shanghai Institute of Microsystem and Information Technology (China)

  • Renhe Zhang, Institute of Acoustics (China)

  • Xuejun Zhang, Changchun Institute of Optics, Fine Mechanics and Physics (China)

  • Pu Zhou, National University of Defense Technology (China)

  • Zhongliang Zhu, Southwest Electronic Telecom Technology Research Institute (China)

Session Chairs

  • 1 Ultrafast Laser Science and Technology

    Shibin Jiang, AdValue Photonics, Inc. (United States)

  • 2 Fiber Lasers I

    Wei Shi, Tianjin University (China)

  • 3 Advanced Laser Materials

    Zhiyi Wei, Institute of Physics (China)

  • 4 Lasers For Advanced Manufacturing

    Guoqiang Xie, Shanghai Jiaotong University (China)

  • 5 Nonlinear Phenomenon in Optoelectronics Materials

    Pu Zhou, National University of Defense Technology (China)

  • 6 Fiber Lasers II

    Jian Zhang, Shanghai Institute of Ceramics (China)

Introduction

The International Symposium on Optoelectronic Technology and Application 2018 (OTA 2018) is the annual conference of the Chinese Society for Optical Engineering. It continues to be one of the largest academic and industrial conferences in the field of optical and optoelectronic technology in China. This year’s program included academic exchanges, industry exhibitions, and cooperation negotiations together in one event. There were five technical conferences, seven exhibition themes, and 600 technical negotiations. We sincerely hope that this event continues to promote research and development of optoelectronic technology and to enhance international cooperation in the optical and optoelectronic fields.

OTA 2018 was sponsored by The Division of Information and Electronic Engineering of the Chinese Academy of Engineering (China), and The Chinese Society for Optical Engineering (CSOE) (China). The conference was organized by the Chinese Society for Optical Engineering (CSOE) (China), the Photoelectronic Technology Committee, the Chinese Society of Astronautics (China), the Photoelectronic Industrialization Committee, CHIA (China), the Department of Cooperation and Coordination for Industry, Academe, and Research, CHIA (China), and the Science and Technology on Low-light-level Night Vision Laboratory (China). We received more than 759 contributions from more than 15 countries, including the United States, United Kingdom, Germany, France, Spain, Australia, Canada, Mexico, Brazil, Japan, Republic of Korea, Thailand, Singapore, Russian Federation and China. There were more than 400 contributions published in SPIE Proceedings, including 70 contributions from invited speakers. After careful discussion, six keynote speeches were selected and presented by famous scientists from the United States, United Kingdom, Republic of Korea, and China. There were 138 excellent invited talks, 45 from overseas, that reflected first-class level in the field of optics and photonics technology. On behalf of the OTA 2018 Organizing Committee, I would like to express thanks to all the invited speakers and authors for their contributions and support.

Finally, on behalf of the other Co-chairmen and the Organizing Committee, I would like to heartily thank our sponsors and cooperating organizers for all they have done for the conference, and to all of the participants and friends for their interests and efforts in helping us to make the conference a success. Thanks also to the Program Committee for their effective work and valuable advice, especially the Secretariat, and to the staff of SPIE for their tireless efforts and outstanding service preparing and publishing the proceedings.

We hope to see you next year!

Guangjun Zhang

© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 10844", Proc. SPIE 10844, Advanced Laser Technology and Applications, 1084401 (12 December 2018); https://doi.org/10.1117/12.2521330
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