Picosecond Electron-Beam And Synchrotron Radiation Pulse Radiolysis For Studies On Electron-Beam And X-Ray Resists

Yoichi Yoshida; Hiromi Shibata; Seiichi Tagawa; Masakazu Washio; Yoneho Tabata; Noriyuki Kouchi; Atsushi Ogata

doi:10.1117/12.953039

30 January 1989 Picosecond Electron-Beam And Synchrotron Radiation Pulse Radiolysis For Studies On Electron-Beam And X-Ray Resists

Yoichi Yoshida, Hiromi Shibata, Seiichi Tagawa, Masakazu Washio, Yoneho Tabata, Noriyuki Kouchi, Atsushi Ogata

Author Affiliations +

Proceedings Volume 1086, Advances in Resist Technology and Processing VI; (1989) https://doi.org/10.1117/12.953039
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

Picosecond electron-beam and synchrotron radiation pulse radiolysis are powerful method to study the reaction mechanism in irradiated electron beam and X-ray resists. The primary processes can be detected spectroscopically by using both pulse radiolysis systems. The details of the pulse radiolysis systems and a typical exsample of pulse radiolysis studies on the resists are introduced.

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Yoichi Yoshida, Hiromi Shibata, Seiichi Tagawa, Masakazu Washio, Yoneho Tabata, Noriyuki Kouchi, and Atsushi Ogata "Picosecond Electron-Beam And Synchrotron Radiation Pulse Radiolysis For Studies On Electron-Beam And X-Ray Resists", Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); https://doi.org/10.1117/12.953039

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