19 July 1989 Metrological Electron Microscope for the Certification of Magnification and Linewidth Artifacts for the Semiconductor Industry
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Abstract
The National Institute of Standards and Technology has, for several years, been developing a metrological electron microscope system traceable to national standards of length. This metrology instrument will certify standards for the calibration of the magnification of scanning electron microscopes (SEM) and for the certification of artifacts for SEM linewidth measurement. These artifacts are not only directed to instruments used in the semiconductor community but will also be useful for the various other applications to which the SEM is currently being used. The SEM-based metrology system now operational at the Institute will be described as well as its design criteria and procedures for its characterization. The design and criteria for a new lithographically produced SEM low-accelerating-voltage magnification standard to be calibrated on this system will also be presented.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael T. Postek, Michael T. Postek, William J. Keery, William J. Keery, Samuel Jones, Samuel Jones, } "Metrological Electron Microscope for the Certification of Magnification and Linewidth Artifacts for the Semiconductor Industry", Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); doi: 10.1117/12.953077; https://doi.org/10.1117/12.953077
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