Resist Profile Control Obtained Through A Desirability Function And Statistically Designed Experiments

K. L. Bell; L. D. H. Christensen

doi:10.1117/12.953102

19 July 1989 Resist Profile Control Obtained Through A Desirability Function And Statistically Designed Experiments

K. L. Bell, L. D. H. Christensen

Proceedings Volume 1087, Integrated Circuit Metrology, Inspection, and Process Control III; (1989) https://doi.org/10.1117/12.953102
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

This paper describes a technique used to determine an optimized microlithographic process using statistical methods which included a statistically designed experiment (SDE); a desirability function, d(θ*); and a rigorous daily statistical process control program, (SPC).

Citation Download Citation

K. L. Bell and L. D. H. Christensen "Resist Profile Control Obtained Through A Desirability Function And Statistically Designed Experiments", Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); https://doi.org/10.1117/12.953102

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