Sub 0.5 Micron Optical Metrology

Brian Chisholm; Don Yansen; Christopher Morrill

doi:10.1117/12.953107

19 July 1989 Sub 0.5 Micron Optical Metrology

Brian Chisholm, Don Yansen, Christopher Morrill

Proceedings Volume 1087, Integrated Circuit Metrology, Inspection, and Process Control III; (1989) https://doi.org/10.1117/12.953107
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

Recent studies show that white light, or broadband, metrology systems continue to be used as the "work-horse" method for measuring features at 1.0 micron and below in production manufacturing environments. With the advances in the area of broadband optical metrology using sophisticated digital-image enhancement techniques, production quality measurements are now possible down to 0.5 micron and below. The purpose of this paper is to show substantial evidence that reliable, fully automatic, high speed, dynamic mode measurements can be made using optical methods on substrates in the range of 0.5 to 0.3 microns, with excellent repeatability and correlation to a SEM reference.

Citation Download Citation

Brian Chisholm, Don Yansen, and Christopher Morrill "Sub 0.5 Micron Optical Metrology", Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); https://doi.org/10.1117/12.953107

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