25 July 1989 ANKAN : Simulator for Resist Exposure and Etching
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Abstract
In this paper, we report the results of ANKAN, a computer program written for the exposure and development of positive photoresist using matrix formulation. Exposure process is modelled using diffraction limited optics and partially coherent light source with a wavelength λ. The program uses string model for resist development. The results of theoretical computations are reported and are found to be in good agreement with those of previous workers. In addition, the program can also be used for computing edge threshold for linewidth measurement and predicting the shape of aerial image for two dimensional objects.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shri N. Gupta, Shri N. Gupta, R. Mehrotra, R. Mehrotra, N. N. Kundu, N. N. Kundu, B. P. Mathur, B. P. Mathur, } "ANKAN : Simulator for Resist Exposure and Etching", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); doi: 10.1117/12.953165; https://doi.org/10.1117/12.953165
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