25 July 1989 Advanced Lithography Excimer System: Absolute Wavelength Adjustment, Five Watt Average Power
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Abstract
A commercial Lambda 248 L excimer system has been equipped with a newly developed wavemeter. The self-controlling laser system can be stabilized at a pre-selected wavelength in the range of 248.180 to 248.580 nm with an absolute accuracy of ± 0.001 nm. Due to the deep-UV stepper optics the wavelength can be adjusted absolutely to comply with different optics. The modified 248 L-system can be operated at an average power of up to 5 W. Experimental results are presented.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. Oesterlin, P. Oesterlin, P. Lokai, P. Lokai, B. Burghardt, B. Burghardt, W. Muckenheim, W. Muckenheim, H.-J. Kahlert, H.-J. Kahlert, D. Basting, D. Basting, "Advanced Lithography Excimer System: Absolute Wavelength Adjustment, Five Watt Average Power", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); doi: 10.1117/12.953168; https://doi.org/10.1117/12.953168
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