25 July 1989 An Analytical Model For The Aerial Image Simulation Of 2-D Mask Structures. Optimization Of The ODB Tapering Method
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Abstract
An analytical model for 2-D non periodic aerial image simulation is proposed for rectangular and circular mask structures. As applications we demonstrate that better resolution in contact opening is acheivable if near circular pattern are designed at mask level. Examples of optimized aerial image for ODB tapering method are shown. Influence of defects on the reticle are considered.
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Marco I. Buraschi, Marco I. Buraschi, Renzo Traversini, Renzo Traversini, } "An Analytical Model For The Aerial Image Simulation Of 2-D Mask Structures. Optimization Of The ODB Tapering Method", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); doi: 10.1117/12.953166; https://doi.org/10.1117/12.953166
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