Broadband Deep-UV High NA Photolithography System

Bruce Ruff; Elizabeth Tai; Robert Brown

doi:10.1117/12.953173

25 July 1989 Broadband Deep-UV High NA Photolithography System

Bruce Ruff, Elizabeth Tai, Robert Brown

Proceedings Volume 1088, Optical/Laser Microlithography II; (1989) https://doi.org/10.1117/12.953173
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

We have constructed and tested a lens for use with deep ultraviolet photolithography systems. This broadband lens may be used with a mercury arc lamp as the illumination source. It is found that this system is an economically sound approach to the implementation of sub-half micron photolithography

Citation Download Citation

Bruce Ruff, Elizabeth Tai, and Robert Brown "Broadband Deep-UV High NA Photolithography System", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); https://doi.org/10.1117/12.953173

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