25 July 1989 Broadband Deep-UV High NA Photolithography System
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Abstract
We have constructed and tested a lens for use with deep ultraviolet photolithography systems. This broadband lens may be used with a mercury arc lamp as the illumination source. It is found that this system is an economically sound approach to the implementation of sub-half micron photolithography
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bruce Ruff, Bruce Ruff, Elizabeth Tai, Elizabeth Tai, Robert Brown, Robert Brown, } "Broadband Deep-UV High NA Photolithography System", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); doi: 10.1117/12.953173; https://doi.org/10.1117/12.953173
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