Diffraction Limited Imaging Using Incoherently Illuminated Holographic Masks

Ginetto Addiego; William G. Oldham

doi:10.1117/12.953158

25 July 1989 Diffraction Limited Imaging Using Incoherently Illuminated Holographic Masks

Ginetto Addiego, William G. Oldham

Proceedings Volume 1088, Optical/Laser Microlithography II; (1989) https://doi.org/10.1117/12.953158
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

Experimental results of a high-resolution holographic imaging system using wave-front conjugation are demon-strated. Using an Argon laser operating at 488 nm with a coherence length of one meter, a hologram is formed from the information on a master mask that is imaged onto a high-resolution recording material with a photographic quality multi-element lens. The hologram is illuminated with a spatially and temporally filtered beam of light centered at 488 nm from a Hg arc lamp to construct the image of the master mask. The aberrations introduced by the imaging lens are eliminated through the process of reverse ray tracing back-through the original lens. The use of a spectrally-broad construction source reduces the effects of optical noise generated in the optical train during the construction of the image. Diffraction limited images are experimentally observed throughout the illuminated field.

Citation Download Citation

Ginetto Addiego and William G. Oldham "Diffraction Limited Imaging Using Incoherently Illuminated Holographic Masks", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); https://doi.org/10.1117/12.953158

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