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25 July 1989 Krypton Fluoride Excimer Laser for Microlithography
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We present the design concepts and performance data for a spectrally-narrowed, wavelength-stabilized KrF laser that meets the specialized requirements of a deep-UV light source for a stepper. Features include: (1) compact size (54cm W x 45cm H x 128cm L), (2) 3 Watt average power with spectral width of 0.003 nm FWHM, (3) long fuel gas life from premixed bottles attained without the need for a gas reprocessor or boost gas, (4) fast and precise wavelength control system that maintains a user-specifiable wavelength to within 0.0005 nm anywhere in the KrF tuning range, (5) microprocessor control, including SECS or custom control protocols, (6) robust, modular internal design for rapid repair, and (7) engineering and packaging that meets semiconductor production tool safety requirements.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. L. Sandstrom, R. P. Akins, U. K. Sengupta, C. Reiser, D. G. Larson, and S. L. Anderson "Krypton Fluoride Excimer Laser for Microlithography", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989);

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