25 July 1989 Modeling Of Optical Alignment Images For Semiconductor Structures
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Abstract
The "wave-guide" model which can be used to study the light scattering problem in optical alignment, has been extended to include illumination with arbitrary polarization and large numerical aperture (NA) lens. An existing simulator has been enhanced to calculate the images of different structures observed under different alignment schemes. It is shown that variations in the polarization conditions and topography may drastically alter the alignment results.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chi-Min Yuan, Jerry Shaw, William Hopewell, "Modeling Of Optical Alignment Images For Semiconductor Structures", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); doi: 10.1117/12.953167; https://doi.org/10.1117/12.953167
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