We address here the optimization of the photolithographic process for submicron design rules. We describe a new method to determine the exposure-focus window corresponding to a user-specified design rule. The change in size and position of the window with changes in design rule, and in process and equipment variables, is the basis for optimization. We describe the implementation of our optimization approach in the MONO-LITH 11/88 Workstation; a computer aided engineering tool that standardizes data acquisition, analysis and presentation, independent of metrology or sampling approach.
Christopher P. Ausschnitt,
"Rapid Optimization Of The Lithographic Process Window", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); doi: 10.1117/12.953140; https://doi.org/10.1117/12.953140