Focused Ion Beam Patterning of High Tc Superconductor Films

L. R. Harriott; P. A. Polakos

doi:10.1117/12.968508

1 August 1989 Focused Ion Beam Patterning of High T_c Superconductor Films

L. R. Harriott, P. A. Polakos

Proceedings Volume 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII; (1989) https://doi.org/10.1117/12.968508
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

We have used a 20 keV Ga focussed ion beam to pattern superconducting submicron bridge structures in thin films of Ba₂YCu₃0₇ material by physical sputtering. The technique can produce structures down to 0.5 microns or less in epitaxial films with no degradation in superconducting transition temperature (T_c) or critical current density (J_o). Photolithography was used to define a coarse pattern of 20 micron wide and 50 micron long strips, each wired for four-terminal resistance measurements. Sub-micron constrictions were then milled by the focused ion beam to form weak-link junctions with roughly 0.3 microns separating the superconducting banks. We have demonstrated that focused ion beam micromachining is capable of producing submicron sized superconducting structures and is a suitable technique for fabricating devices such as SQUIDS and the study of grain boundary effects in the films.

Citation Download Citation

L. R. Harriott and P. A. Polakos "Focused Ion Beam Patterning of High T_c Superconductor Films", Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); https://doi.org/10.1117/12.968508

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