1 August 1989 Repair Of Dear Defects On X-Ray Masks By Ion-Induced Metal Deposition
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Abstract
To investigate the repair of clear defects on X-ray masks by ion-induced metal deposition, a photomask repair system was modified to allow for the localized deposition of tungsten from a gas jet of W(CO)6 vapor. With this system, dense W layers could be deposited at rates of up to 4 nm/s; the X-ray opacity of layers having a thickness of down to 200 nm was demonstrated by X-ray lithographic resist exposures using synchrotron radiation.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hans-Christian Petzold, Hans-Christian Petzold, Helmut Burghause, Helmut Burghause, Renate Putzar, Renate Putzar, Uwe Weigmann, Uwe Weigmann, Nicholas P. Economou, Nicholas P. Economou, Lewis A. Stern, Lewis A. Stern, } "Repair Of Dear Defects On X-Ray Masks By Ion-Induced Metal Deposition", Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); doi: 10.1117/12.968513; https://doi.org/10.1117/12.968513
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