1 August 1989 Repair Of Dear Defects On X-Ray Masks By Ion-Induced Metal Deposition
Author Affiliations +
To investigate the repair of clear defects on X-ray masks by ion-induced metal deposition, a photomask repair system was modified to allow for the localized deposition of tungsten from a gas jet of W(CO)6 vapor. With this system, dense W layers could be deposited at rates of up to 4 nm/s; the X-ray opacity of layers having a thickness of down to 200 nm was demonstrated by X-ray lithographic resist exposures using synchrotron radiation.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hans-Christian Petzold, Hans-Christian Petzold, Helmut Burghause, Helmut Burghause, Renate Putzar, Renate Putzar, Uwe Weigmann, Uwe Weigmann, Nicholas P. Economou, Nicholas P. Economou, Lewis A. Stern, Lewis A. Stern, "Repair Of Dear Defects On X-Ray Masks By Ion-Induced Metal Deposition", Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); doi: 10.1117/12.968513; https://doi.org/10.1117/12.968513


3D, high-resolution deep x-ray absorber mask
Proceedings of SPIE (August 17 2000)
Issues in the repair of x-ray masks
Proceedings of SPIE (February 28 1991)
X-ray mask defect repair optimization
Proceedings of SPIE (June 24 1999)
Focused ion beams for x-ray mask repair
Proceedings of SPIE (November 02 1994)
Focused ion beam induced deposition: a review
Proceedings of SPIE (July 31 1991)

Back to Top