1 August 1989 Repair Of Dear Defects On X-Ray Masks By Ion-Induced Metal Deposition
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Abstract
To investigate the repair of clear defects on X-ray masks by ion-induced metal deposition, a photomask repair system was modified to allow for the localized deposition of tungsten from a gas jet of W(CO)6 vapor. With this system, dense W layers could be deposited at rates of up to 4 nm/s; the X-ray opacity of layers having a thickness of down to 200 nm was demonstrated by X-ray lithographic resist exposures using synchrotron radiation.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hans-Christian Petzold, Hans-Christian Petzold, Helmut Burghause, Helmut Burghause, Renate Putzar, Renate Putzar, Uwe Weigmann, Uwe Weigmann, Nicholas P. Economou, Nicholas P. Economou, Lewis A. Stern, Lewis A. Stern, "Repair Of Dear Defects On X-Ray Masks By Ion-Induced Metal Deposition", Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); doi: 10.1117/12.968513; https://doi.org/10.1117/12.968513
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