Translator Disclaimer
1 August 1989 Synchrotron X-ray Lithography System Using A Compact Source
Author Affiliations +
Abstract
Synchrotron radiation x-rays are effective and powerful sources for x-ray lithography when semiconductor feature size is less than a half micron. A compact synchrotron radiation ring comprising superconducting magnets was developed as an x-ray lithography source. An x-ray exposure system, including a beam line and a vertical stepper, was also developed. Several test exposures confirmed that this synchrotron lithography system is applicable to quarter-micron x-ray lithography.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Toyoki Kitayama, Toa Hayasaka, Hideo Yoshihara, and Sunao Ishihara "Synchrotron X-ray Lithography System Using A Compact Source", Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); https://doi.org/10.1117/12.968524
PROCEEDINGS
5 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

Present status of x-ray lithography
Proceedings of SPIE (September 01 1998)
Pulsed Plasma Source For X-Ray Lithography
Proceedings of SPIE (July 28 1981)
An X-Ray Stepper For Production Lithography
Proceedings of SPIE (June 30 1987)
Overview of ASET PXL and EUVL programs in Japan
Proceedings of SPIE (July 21 2000)
Evaluation of a laser-based proximity x-ray stepper
Proceedings of SPIE (July 09 1992)

Back to Top