1 August 1989 Synchrotron X-ray Lithography System Using A Compact Source
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Abstract
Synchrotron radiation x-rays are effective and powerful sources for x-ray lithography when semiconductor feature size is less than a half micron. A compact synchrotron radiation ring comprising superconducting magnets was developed as an x-ray lithography source. An x-ray exposure system, including a beam line and a vertical stepper, was also developed. Several test exposures confirmed that this synchrotron lithography system is applicable to quarter-micron x-ray lithography.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Toyoki Kitayama, Toyoki Kitayama, Toa Hayasaka, Toa Hayasaka, Hideo Yoshihara, Hideo Yoshihara, Sunao Ishihara, Sunao Ishihara, } "Synchrotron X-ray Lithography System Using A Compact Source", Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); doi: 10.1117/12.968524; https://doi.org/10.1117/12.968524
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