Presentation + Paper
4 March 2019 Characterization of the thermo-optic coefficient of silicon oxynitride using whispering gallery mode optical microcavities
Author Affiliations +
Abstract
Recent advances in optical materials have enabled the development of a wide range of integrated photonic devices from high speed modulators to frequency combs. With low optical loss over a wide wavelength range and environmental stability in ambient environments for several weeks, silicon oxynitride (SiOxNy) shows potential in many of these applications. However, unlike many classic optical materials, the thermo-optic response (dn/dT) in both the visible and near-IR is poorly characterized, limiting researcher’s ability to accurately model device performance. Here, we leverage the intrinsic thermal response of resonant cavities to measure the dn/dT of SiOxNy with a 12.7:1 and 4:1 oxygen to nitrogen ratio based on EDX measurements. The thermo-optic coefficient is measured in the visible and near-IR and compared with SiO2. The refractive indices of the silicon oxynitride films were also measured using spectroscopic ellipsometry. Based on an analysis of the O:N ratio and a comparison with both SiO2 and Si3N4, an expression for the dependence of the dn/dT on the stoichiometric ratio is developed.
Conference Presentation
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andre Kovach, Dongyu Chen, Soheil Soltani, Sumiko Poust, Vincent Gambin, and Andrea M. Armani "Characterization of the thermo-optic coefficient of silicon oxynitride using whispering gallery mode optical microcavities", Proc. SPIE 10904, Laser Resonators, Microresonators, and Beam Control XXI, 109041A (4 March 2019); https://doi.org/10.1117/12.2507561
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KEYWORDS
Silicon

Refractive index

Thermal optics

Integrated optics

Resonators

Silica

Temperature metrology

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