Translator Disclaimer
4 March 2019 Study of plasma formation in solid dielectrics with the help of low-order harmonic emission
Author Affiliations +
Abstract
The applications of ultrashort laser pulses (< 1 ps duration) for micromachining have continuously expanded during the past decade. In particular, femtosecond (fs) laser sources represent unique tools for microprocessing solid dielectrics such as glasses, crystals, or bio-compatible materials. The chain of physical events leading to laser-induced material modification starts with the formation of an electron-hole plasma which essentially proceeds through two distinct channels: strong-field ionization (SFI) and electron-electron impact ionization (EEII). In solids, these mechanisms take place intrapulse, i.e. when the electric field from the laser pulse is still present in the interaction region. Because of the short timescales involved and because of their concomitant character, determining the relative importance of the ionization channels at play is very challenging. In this article, we describe a strategy to determine the relative importance of SFI versus collisional ionization in the plasma formation when irradiating solid dielectrics with ultrashort pulses.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alexandre Mermillod-Blondin, Peter Jürgens, Benjamin Liewehr, Björn Kruse, Christian Peltz, Tobias Witting, Anton Husakou, Mikhail Ivanov, Thomas Fennel, and Marc J. J. Vrakking "Study of plasma formation in solid dielectrics with the help of low-order harmonic emission", Proc. SPIE 10905, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXIV, 109050O (4 March 2019); doi: 10.1117/12.2507836; https://doi.org/10.1117/12.2507836
PROCEEDINGS
6 PAGES


SHARE
Advertisement
Advertisement
Back to Top