Characterization of Mn doped ZnO wrinkle-network nanostructured thin films deposited by sol-gel spin coating technique

Kamal Rudra; Ashutosh Dikshit; Abhishek Singh; Y. K. Prajapati; P. Chakrabarti

doi:10.1117/12.2525236

1 March 2019 Characterization of Mn doped ZnO wrinkle-network nanostructured thin films deposited by sol-gel spin coating technique

Kamal Rudra, Ashutosh Dikshit, Abhishek Singh, Y. K. Prajapati, P. Chakrabarti

Author Affiliations +

Proceedings Volume 10919, Oxide-based Materials and Devices X; 109192Q (2019) https://doi.org/10.1117/12.2525236
Event: SPIE OPTO, 2019, San Francisco, California, United States

Abstract

A wrinkle-network structure of Mn doped ZnO is presented in this paper. The undoped and Mn doped ZnO thin film samples have been prepared on ITO coated glass substrates by sol-gel spin coating technique as it is a simple and lowcost method to deposit semiconductor thin films. High resolution X-ray diffraction technique confirms the formation of hexagonal wurtzite structure with diffraction pattern corresponding to ZnO. Mn related phases have not been observed within the detection limit of HR-XRD. The incorporation of Mn dopant in the sample has been confirmed by energy dispersive X-ray spectroscopy (EDS). Both the undoped and Mn doped samples have high optical transmittance in the wavelength range of 300 nm – 800 nm, with a maximum of 88% as recorded by UV-VIS spectroscopy. There is an increase in the bandgap of ZnO thin films by the introduction of Mn dopants which has been calculated by Tauc plot.

Citation Download Citation

Kamal Rudra, Ashutosh Dikshit, Abhishek Singh, Y. K. Prajapati, and P. Chakrabarti "Characterization of Mn doped ZnO wrinkle-network nanostructured thin films deposited by sol-gel spin coating technique", Proc. SPIE 10919, Oxide-based Materials and Devices X, 109192Q (1 March 2019); https://doi.org/10.1117/12.2525236

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