Paper
29 May 2019 Fabrication of phononic filter structures for far-IR/sub-mm detector applications
Kevin L. Denis, Karwan Rostem, Marco A. Sagliocca, Elissa H. Williams, Edward J. Wollack
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Abstract
A photon noise limited sub-mm/far-IR cold telescope in space will require detectors with noise equivalent power (NEP) less than 1x10-19 W/Hz1/2 for imaging applications and at least an order of magnitude lower for spectroscopic studies. The detector NEP can be reduced by lowering the operation temperature and improving the thermal isolation between the bolometer and a heat bath. We report on the fabrication of membrane isolated transition edge sensor bolometers incorporating compact (<50 μm) thermal isolation beams based on phononic filters. Phononic filters are created by etching quasi-periodic nanoscale structures into supporting thermo-mechanical beams. The cross-sectional dimensions of the etched features are less than the thermal wavelength at the operating temperature, enabling coherent phonon transport to take place in one dimension. The phonon stop-band can be tuned by adjusting the scale of the quasi-periodic structures. Cascading multiple filter stages can increase bandwidth and provide improved thermal isolation similar to the function of a multi-stage electrical filter. We describe the fabrication of AlMn based transition edge sensor bolometers on silicon and silicon nitride membranes isolated by one- and two-dimensional phononic filters. The phononic filters are patterned through electron beam lithography and isolated with deep reactive ion etching.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kevin L. Denis, Karwan Rostem, Marco A. Sagliocca, Elissa H. Williams, and Edward J. Wollack "Fabrication of phononic filter structures for far-IR/sub-mm detector applications", Proc. SPIE 10927, Photonic and Phononic Properties of Engineered Nanostructures IX, 1092720 (29 May 2019); https://doi.org/10.1117/12.2506387
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KEYWORDS
Semiconducting wafers

Etching

Sensors

Silicon

Electron beam lithography

Gold

Bolometers

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