Fundamentals of resist stochastics effect for single-expose EUV patterning

Anuja De Silva; Luciana Meli; Dario L. Goldfarb; Nelson M. Felix

doi:10.1117/12.2515926

26 March 2019 Fundamentals of resist stochastics effect for single-expose EUV patterning

Anuja De Silva, Luciana Meli, Dario L. Goldfarb, Nelson M. Felix

Proceedings Volume 10957, Extreme Ultraviolet (EUV) Lithography X; 109570F (2019) https://doi.org/10.1117/12.2515926
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

As the industry looks to extend single-expose extreme ultraviolet (EUV) lithography, stochastic effects become a significant concern to enable yield, for both trench and via levels. Multiple previously-published reports have shown a strong tradeoff between resist sensitivity and observed stochastic defectivity. However, the limits of this trade-off between improving stochastics-related defects with a higher dose resist remains to be understood. How strongly does the resist formulation itself contribute to stochastics, or is it a purely dosedriven effect? In this paper, we perform a systematic evaluations of resist component variants to determine the relative effects of photon shot noise induced stochastics vs material stochastics. Material contributions are probed through formulation component and reaction kinetics changes. The defectivity at post-exposure and post-etch are correlated to electrical yield to validate the evaluation. The effect of material and dose contribution to defectivity process window enables to highlight the significant and challenging task of addressing material stochastics that can be convoluted with photon shot noise.

Conference Presentation

Citation Download Citation

Anuja De Silva, Luciana Meli, Dario L. Goldfarb, and Nelson M. Felix "Fundamentals of resist stochastics effect for single-expose EUV patterning", Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570F (26 March 2019); https://doi.org/10.1117/12.2515926

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available