Presentation + Paper
26 March 2019 3D mask effects in high NA EUV imaging
Author Affiliations +
Abstract
Understanding, characterization and management of 3D mask effects, including non-telecentricity, contrast fading and best focus shifts, become increasingly important for the performance optimization of future extreme ultraviolet (EUV) projection systems and mask designs. Novel imaging configuration and central obscuration in high NA EUV projection systems introduce additional imaging effects. A simplified coherent imaging model, rigorous mask diffraction simulations, images for individual source areas and a hybrid mask model are employed to analyze the root causes of observed imaging artifacts. Based on this, several image enhancement strategies including modifications of mask and source are devised and investigated for lines/spaces.
Conference Presentation
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andreas Erdmann, Peter Evanschitzky, Gerardo Bottiglieri, Eelco van Setten, and Timon Fliervoet "3D mask effects in high NA EUV imaging", Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570Z (26 March 2019); https://doi.org/10.1117/12.2515678
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CITATIONS
Cited by 3 scholarly publications.
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KEYWORDS
Diffraction

Photomasks

Extreme ultraviolet

3D modeling

3D image processing

Lithography

Projection systems

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