Oxygen effects in thin films for high-resolution , 3-color lithography

Sandra A. Gutierrez Razo; Nikolaos Liaros; Adam Pranda; Gottlieb Oehrlein; John T. Fourkas; John Petersen

doi:10.1117/12.2516544

26 March 2019 Oxygen effects in thin films for high-resolution , 3-color lithography

Sandra A. Gutierrez Razo, Nikolaos Liaros, Adam Pranda, Gottlieb Oehrlein, John T. Fourkas, John Petersen

Proceedings Volume 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019; 1095814 (2019) https://doi.org/10.1117/12.2516544
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

Three-color lithography (3CL) produces features on the scale of tens of nanometers using visible light. In this technique, one beam pre-activates a photoresist, a second beam deactivates it, and a third beam activates the pre-activated regions that have not been deactivated. The deactivation beam trims features, allowing for improved feature size and resolution. Creating permeable thin films enables us to further control feature size using oxygen as a quencher. We will discuss these thin-film studies, which are a promising step towards large-area patterning.

Citation Download Citation

Sandra A. Gutierrez Razo, Nikolaos Liaros, Adam Pranda, Gottlieb Oehrlein, John T. Fourkas, and John Petersen "Oxygen effects in thin films for high-resolution , 3-color lithography", Proc. SPIE 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019, 1095814 (26 March 2019); https://doi.org/10.1117/12.2516544

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