In this paper, we investigate overlay metrology and overlay correction with MCR. Even though the optical contrast for MCR is slightly lower than for chemically amplified resist (CAR) it seemed sufficient for high-quality overlay metrology. However, the measurement precision for MCR is deteriorated compared to that for CAR, resulting in significantly higher residuals. The root cause of the deteriorated measurement precision was found in grains in the optical image after MCR development. Interestingly, the after etch performance of CAR and MCR is identical. We demonstrate that with sufficient sampling, appropriate correctables can be extracted from the MCR overlay results. Finally, we discuss how the increased image noise can be compensated by the applied sampling scheme.
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