In this work, we explore backscattered electron (BSE) imaging and its applicability in 3D metrology of the HAR holes. Monte Carlo simulations were performed to estimate the BSE signals emitted from the HAR holes. The simulation results demonstrate that the BSE signal intensity decreases exponentially with increasing the depth of the irradiated location in the HAR holes. Based on the characteristics of the BSE signal intensity, an algorithm utilizing depth-correlated BSE signal intensity was proposed for the 3D metrology of the HAR holes. Furthermore, several types of holes with different taper angles and different bowing profiles were fabricated and experiments were performed to verify the feasibility of the proposed algorithm. The cross-sectional profiles of the fabricated holes which are created using the BSE profiles are matching with the as-cleaved cross section observed by X-SEM. These results demonstrate that the 3D-profile variation of the HAR holes induced by the etching processes can be identified by our approach.
You have requested a machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Neither SPIE nor the owners and publishers of the content make, and they explicitly disclaim, any express or implied representations or warranties of any kind, including, without limitation, representations and warranties as to the functionality of the translation feature or the accuracy or completeness of the translations.
Translations are not retained in our system. Your use of this feature and the translations is subject to all use restrictions contained in the Terms and Conditions of Use of the SPIE website.