Edge placement error and line edge roughness

Vassilios Constantoudis; George Papavieros; Evangelos Gogolides

doi:10.1117/12.2523419

26 March 2019 Edge placement error and line edge roughness

Vassilios Constantoudis, George Papavieros, Evangelos Gogolides

Proceedings Volume 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII; 109591F (2019) https://doi.org/10.1117/12.2523419
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

The aim of this work is to clarify the quantitative relationship between the Edge Placement Error (EPE) and Line Edge Roughness (LER) in a rough pattern. Using a computational modelling approach to isolate this relationship, we show that despite the dominant role of Rms(LER), EPE is also affected by the correlation length especially at long length of interests. Similarly, we demonstrate and quantify the positive correlation of the edge correlation coefficient with Image Placement Error. The ultimate concern is to get design-rule determinations based on EPE definitions and characterization which is informed by modern manufacturing and metrology aspects of LER.

Citation Download Citation

Vassilios Constantoudis, George Papavieros, and Evangelos Gogolides "Edge placement error and line edge roughness", Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 109591F (26 March 2019); https://doi.org/10.1117/12.2523419

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