Translator Disclaimer
Paper
26 March 2019 Parallel active cantilever AFM tool for high-throughput inspection and metrology
Author Affiliations +
Abstract
Atomic Force Microscopy (AFM) is a capable to provide high resolution CD-metrology and precise defects analysis on large wafers, masks or displays. However, AFM is not enough productive for high-throughput industrial uses. Standard single probe AFMs are showing low throughput as a serial imaging tools. The use of an array of four cantilevers as a Quattro-Array results in effective speed of 6 to 10 mm/s. An image size of 0.5mm x 0.2mm is achieved employing a piezoelectric positioner with a scan range of 200μm x 200μm and a resolution of 0.25nm (x,y) and 0.2nm (z), respectively. These capabilities are qualifying the Quattro-cantilever array system as fastest tool for. In this paper we present new results obtained with our Quattro-AFM high-throughput parallel SPM system that exhibits two key advances that are required for a successful deployment of SPM in time-efficient metrology, defect analysis and mask inspection.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mathias Holz, Christoph Reuter, Ahmad Ahmad, Alexander Reum, Tzvetan Ivanov, Elshad Guliyev, Ivo W. Rangelow, and Ho-Se Lee "Parallel active cantilever AFM tool for high-throughput inspection and metrology", Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 1095929 (26 March 2019); https://doi.org/10.1117/12.2515091
PROCEEDINGS
6 PAGES


SHARE
Advertisement
Advertisement
Back to Top