Oligomers of MORE: Molecular Organometallic Resists for EUV

Shaheen Hasan; Michael Murphy; Maximilian Weires; Steven Grzeskowiak; Greg Denbeaux; Robert L. Brainard

doi:10.1117/12.2516010

8 April 2019 Oligomers of MORE: Molecular Organometallic Resists for EUV

Shaheen Hasan, Michael Murphy, Maximilian Weires, Steven Grzeskowiak, Greg Denbeaux, Robert L. Brainard

Proceedings Volume 10960, Advances in Patterning Materials and Processes XXXVI; 109601Q (2019) https://doi.org/10.1117/12.2516010
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

The EUV photoproducts of antimony carboxylate photoresists [R₃Sb(O₂CR′)₂] are used to evaluate a possible free radical exposure mechanism by studying the change in molecular weight distribution with dose. We demonstrate the redistribution of carboxylate ligands across the metal centers in solution and use this property to create a statistical mono-olefin resist system with blended solutions of olefinic and non-olefinic antimony compounds that limit crosslinking and improve solubility of the photoproducts. Through gel permeation chromatography (GPC) analysis, we demonstrate the formation of high molecular weight oligomers with exposure dose and provide further support for the free-radical polymerization mechanism.

Citation Download Citation

Shaheen Hasan, Michael Murphy, Maximilian Weires, Steven Grzeskowiak, Greg Denbeaux, and Robert L. Brainard "Oligomers of MORE: Molecular Organometallic Resists for EUV", Proc. SPIE 10960, Advances in Patterning Materials and Processes XXXVI, 109601Q (8 April 2019); https://doi.org/10.1117/12.2516010

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