Radical sensitive zinc-based nanoparticle EUV photoresists

Kou Yang; Hong Xu; Kazunori Sakai; Vasiliki Kosma; Emmanuel P. Giannelis; Christopher K. Ober

doi:10.1117/12.2514982

25 March 2019 Radical sensitive zinc-based nanoparticle EUV photoresists

Kou Yang, Hong Xu, Kazunori Sakai, Vasiliki Kosma, Emmanuel P. Giannelis, Christopher K. Ober

Proceedings Volume 10960, Advances in Patterning Materials and Processes XXXVI; 109601R (2019) https://doi.org/10.1117/12.2514982
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

Zirconium- and hafnium-based nanoparticles demonstrated good patterning behavior in deep-ultra-violet (DUV), electron-beam (E-beam) and extreme ultra-violet (EUV) lithography. Among these Zr- and Hf-based hybrid nanoparticles, the methacrylic acid (MAA) modified zirconium oxide nanoparticles¹ (ZrO₂-MAA-NP) give out the best over-all-performance: 26 nm lines are obtained at 4.2 mJ/cm². However, both Zr and Hf are relatively low EUV absorbing metals², and integration of high EUV absorption elements, such as Zn, is considered to be a more promising route to further improve lithographic performance under EUV radiation. Zinc-based nanoparticle photoresists, possessing ultra-small size, have exhibited promising sensitivities and better resolution. Here, we combined methacrylate ligand and high EUV absorption element Zn, to demonstrate a novel zinc oxide-based nanoparticle photoresist using a photo-radical generator (PRG). Compared with conventional photo-acid initiated nanoparticle-based photoresists, a better resolution and sensitivity has been found with the addition of photo-radical generator (PRG). This unique behavior is promising to provide new possibilities for rapid three-dimensional (3D) -printing.

Citation Download Citation

Kou Yang, Hong Xu, Kazunori Sakai, Vasiliki Kosma, Emmanuel P. Giannelis, and Christopher K. Ober "Radical sensitive zinc-based nanoparticle EUV photoresists", Proc. SPIE 10960, Advances in Patterning Materials and Processes XXXVI, 109601R (25 March 2019); https://doi.org/10.1117/12.2514982

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