CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 10961 > Article
Open Access Presentation
18 March 2019 Software in semiconductor manufacturing: peripeteias and prospects (Conference Presentation)
Yuri Granik
Author Affiliations +
Proceedings Volume 10961, Optical Microlithography XXXII; 1096103 (2019) https://doi.org/10.1117/12.2514761
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States
Abstract
We explore role of software modeling in semiconductor manufacturing and contrast it with the roles that modeling plays in other fields of human activity. Major trends and challenges in physical and compact process modeling are discussed. We contemplate complexities arising from their multi-dimensional nature. The landscape of Optical Proximity Correction and satellite applications is surveyed. Instructive examples are collected that demonstrate shortcomings of our intuition while dealing with complex systems and parameter interactions. We ponder over the scientific and business opportunities of new promising techniques and prospective applications.
Conference Presentation
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Yuri Granik "Software in semiconductor manufacturing: peripeteias and prospects (Conference Presentation)", Proc. SPIE 10961, Optical Microlithography XXXII, 1096103 (18 March 2019); https://doi.org/10.1117/12.2514761
PROCEEDINGS
 PRESENTATION
WATCH
PRESENTATION SAVE TO MY LIBRARY
GET CITATION
Advertisement
Advertisement
KEYWORDS
Semiconductor manufacturing
Complex systems
Optical proximity correction
Process modeling
Satellites
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top